双图案化技术制备声表面波滤波器的工艺路线

Fabrication Process for Surface Acoustic Wave Filters Using DualPatterning Technology

摘要:

研究了声表面波滤波器的光刻工艺。通过双图案化技术将一套密度高且复杂的芯片图形拆分成两套分立的、密度低且简单的图形。通过双重曝光技术先后将占空比差异较大的两组叉指电极曝光在同一层光刻胶中，降低了光刻工艺的复杂程度，提高了芯片图形的光刻质量。芯片的性能与仿真结果一致。

Abstract:

This study investigates the photolithography process for surface acoustic wave filters. By employing double-patterning technology， high-density and complex chip patterns are decomposed into two separate， low-density and simplified patterns. Through dual-exposure technology， two sets of interdigitated electrodes with significant duty ratio differences are sequentially exposed onto the same layer of photoresist. This method reduces the complexity of the photolithography process while enhancing the photolithographic quality of the chip patterns. Notably， the performance of the fabricated chips aligns with simulation results.